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Theme

For any plasma-based societal application, one has to develop a process known as plasma process using the device called as plasma source. The diagnostic tools are used to aid in the understanding of plasma physics and chemistry, so that processes and hardware can be optimized. For this purpose, the diagnostic tools are used in R&D Labs. Plasma diagnostic techniques are also sought after to serve as sensors for process control in different industries aimed at societal growth and development. 

Abstract

Plasma is widely recognized as a powerful tool with applications ranging from everyday technologies to advanced scientific research. One of the most ambitious goals in plasma science is the realization of sustainable green energy through nuclear fusion. Alongside fusion research, considerable attention has been devoted to low-temperature plasmas and their societal applications. Operating from low pressure to atmospheric conditions, these plasmas have emerged as versatile platforms for applications in energy, electronics, agriculture, biomedical engineering, food preservation, and textiles. In the energy and environmental sectors, plasma technologies are increasingly explored for hydrogen production, plasma-assisted combustion, carbon dioxide conversion, waste treatment, and pollution control. For practical implementation, plasma processes must be carefully designed and controlled through optimized process recipes governed by plasma parameters and the energy of plasma species. Advanced plasma diagnostic techniques and computational modeling therefore play a crucial role in understanding plasma behavior and optimizing processing conditions. The major applications of low-temperature plasmas is the synthesis and modification of thin films for industrial technologies. Plasma-based deposition techniques, such as Plasma-Enhanced Chemical Vapor Deposition and Magnetron Sputtering, enable the fabrication of advanced thin-film functional materials with controlled composition, structure, and surface properties. The structure of thin films is strongly influenced by plasma parameters and active species, including electrons, ions, radicals, and neutrals. However, precise and reproducible control of film growth remains challenging due to the inherent complexity of plasma processes. Consequently, fundamental studies combining plasma diagnostics, experiments, and numerical simulations are essential for molecular-scale control of film growth and the development of next-generation nanoscale materials for aerospace, defence, energy, and environmental applications.

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Topics of Event

  • ••  Plenary and Keynote Lectures (Global Experts)

  • ••  Laboratory Plasma Sources

  • ••  Plasmas for Space Mission and Defence

  • ••  Plasma in Material Processing for Semiconductors

  • ••  Plasma in Bio/healthcare and Agriculture

  • ••  Plasma Processes and Role of Diagnostics

  • ••  Energy Conversion and Environment Technologies

  • ••  Industry Session (Presentation by Industry people)

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Dr. Bibhuti Bhusan Sahu

Convener, IPPD2026

Department of Energy Science and Engineering,

IIT Delhi, Hauz Khas, Delhi-110016,

Phone : +91-11- 26591259

Email: ippd.2025.iitd@gmail.com

 

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